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Louis Markoya Phones & Addresses

  • Bethel, CT
  • 17 Francis St, Fairfield, CT 06430
  • 2 Olive Ln, Ridgefield, CT 06877
  • 2 Olive Ln, Ridgefield, CT 06877
  • 30 Honey Ln, Sandy Hook, CT 06482
  • Shelton, CT
  • Wilton, CT
  • Saint Petersburg, FL

Publications

Us Patents

Use Of Multiple Reticles In Lithographic Printing Tools

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US Patent:
6628372, Sep 30, 2003
Filed:
Feb 16, 2001
Appl. No.:
09/785777
Inventors:
Andrew W. McCullough - Newtown CT,
Christopher Mason - Newtown CT,
Louis Markoya - Shelton CT,
Harry Sewell - Ridgefield CT,
International Classification:
G03B 2762
US Classification:
355 75, 355 53
Abstract:
A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used.

Lithographic Apparatus With A Fluid Combining Unit And Related Device Manufacturing Method

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US Patent:
8045135, Oct 25, 2011
Filed:
Nov 22, 2006
Appl. No.:
11/603255
Inventors:
Johannes Catharinus Hubertus Mulkens - Waalre,
Matthew Lipson - Stamford CT,
Harry Sewell - Ridgefield CT,
Louis John Markoya - Sandy Hook CT,
Assignee:
ASML Netherlands B.V. - Veldhoven
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/52
G03B 27/42
US Classification:
355 30, 355 53
Abstract:
A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.

Line Width Insensitive Wafer Target Detection In Two Directions

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US Patent:
5966215, Oct 12, 1999
Filed:
Apr 13, 1999
Appl. No.:
9/290217
Inventors:
Louis Markoya - Shelton CT
Joseph Lyons - Wilton CT
Assignee:
SVG Lithography Systems, Inc. - Wilton CT
International Classification:
G01N 1100
US Classification:
356400
Abstract:
An alignment system for use in semiconductor manufacturing that matches pairs of like edges of alignment marks. Grating type alignment marks are illuminated by a predetermined illumination pattern with the reflected and/or scattered electromagnetic radiation collected by a detector. Like edges are selected from the collected electromagnetic radiation and matched. A signal analyzer analyses the matched like edges and obtains alignment information. The matching of like edges results in relatively process insensitive detection of wafer alignment marks. The distance between like edges is substantially less effected by wafer processing. Wafer alignment marks can thereby be more accurately detected, resulting in improved positioning and alignment accuracies. This improves and advances the technology use to manufacture semiconductor devices.

Lithographic Apparatus, Fluid Combining Unit And Device Manufacturing Method

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US Patent:
2012001, Jan 19, 2012
Filed:
Sep 21, 2011
Appl. No.:
13/238941
Inventors:
Johannes Catharinus Hubertus MULKENS - Waalre,
Matthew LIPSON - Stamford CT,
Harry SEWELL - Ridgefield CT,
Louis John MARKOYA - Sandy Hook CT,
Assignee:
ASML HOLDING N.V. - Veldhoven
ASML NETHERLANDS B.V. - Veldhoven
International Classification:
G03B 27/52
US Classification:
355 30, 355 77
Abstract:
A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.

Systems And Methods For Thermally-Induced Aberration Correction In Immersion Lithography

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US Patent:
2011026, Oct 27, 2011
Filed:
Jul 6, 2011
Appl. No.:
13/176898
Inventors:
Harry Sewell - Ridgefield CT,
Louis John Markoya - Sandy Hook CT,
Diane Czop McCafferty - Sandy Hook CT,
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/52
US Classification:
355 30, 355 55
Abstract:
Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.

Fluid Handling Device, An Immersion Lithographic Apparatus And A Device Manufacturing Method

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US Patent:
2010021, Aug 26, 2010
Filed:
Feb 24, 2010
Appl. No.:
12/711825
Inventors:
Harry Sewell - Ridgefield CT,
Sjoerd Nicolaas lambertus Donders - Vught,
Louis John Markoya - Sandy Hook CT,
Diane McCafferty - Sandy Hook CT,
Ralph Joseph Meijers - Kerkrade,
Assignee:
ASML Holding N.V. - Veldhoven
ASML Netherlands B.V. - Veldhoven
International Classification:
G03B 27/52
US Classification:
355 30
Abstract:
A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings.

Re-Flow And Buffer System For Immersion Lithography

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US Patent:
2009021, Aug 27, 2009
Filed:
Feb 19, 2009
Appl. No.:
12/388900
Inventors:
Harry Sewell - Ridgefield CT,
Erik Theodorus Maria Bijlaart - Rosmalen,
Sjoerd Nicolaas Lambertus Donders - Vught,
Louis John Markoya - Sandy Hook CT,
Diane McCafferty - Sandy Hook CT,
Ralph Joseph Meijers - Kerkrade,
Assignee:
ASML NETHERLANDS B.V. - Veldhoven
ASML Holding NV - Veldhoven
International Classification:
G03B 27/52
G01N 7/00
US Classification:
355 30, 73 3104
Abstract:
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.

Immersion Lithography Apparatus

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US Patent:
2009019, Jul 30, 2009
Filed:
Jan 23, 2009
Appl. No.:
12/358931
Inventors:
Harry SEWELL - Ridgefield CT,
Louis John Markoya - Sandy Hook CT,
Assignee:
ASML HOLDING NV - Veldhoven
International Classification:
G03B 27/52
US Classification:
355 30
Abstract:
An immersion lithographic apparatus is disclosed having a projection system, a liquid supply system, and a recycling system. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, wherein a substrate table is configured to support the substrate. The liquid supply system is configured to provide an immersion liquid to a space between the projection system and the substrate or the substrate table. The recycling system is configured to collect the immersion liquid from the liquid supply system and to supply the immersion liquid to the liquid supply system. The recycling system includes a fiber configured to remove organic contaminants from the immersion liquid.
Louis J Markoya from Bethel, CT, age ~94 Get Report